DC Plasma Excitation

DC / Arc / Bias 3000 series


DC Plasma Excitation


Direct current generators from TRUMPF Hüttinger are classics when it comes to DC plasma excitation. They are mainly used in single cathode systems, for the application of conductive layers on solar cells and semi-conductors, as well as for the polarization of substrates, for example. Nowadays DC generators are used in numerous applications as an example of cost-effective entry technology into plasma excitation.





TruPlasma DC Series 3000 (G2)

Perfection for all surfaces


The latest generation of compact DC generators

The TruPlasma DC Series 3000 (G2) is suitable for a number of DC sputtering processes – including use as a replacement for pulsed process power supplies. This is because progressive arc management offers a guarantee for the best layer qualities and a significantly higher production yield. Because of its extremely compact design you can integrate the water-cooled DC generators very easily into your current application.

n   Lowest arc energy in its class

n   High power density

n   Wide power range

n   Complete water cooling 

n   Simple system integration





TruPlasma DC Serie 3000

Compact and reliable


DC generators for demanding plasma processes

With a wide range of performance and fast arc detection, the DC generators of the TruPlasma DC Series 3000 provide the assurance of makellose surfaces and high coating rates - even in particularly demanding DC sputtering processes with critical materials. Thanks to air cooling, they are particularly compact and can be easily integrated into any system.

n   Wide range of performance

n   Compact and robust design

n   Delay-free Arc detection

n   Easy system integration






TruPlasma Arc Series 3000

Achieve impressive hard material coating with arcs


Productivity redefined

The TruPlasma Arc Series 3000 product family is a key component in arc cathode processes in rough industrial environments. The generators are particularly impressive for hard material and decorative coatings. Additionally, they are a selected energy source for numerous high power applications, such as ion implantation and DC applications with similar requirements.

n   Ideal for hard material coating

n   Ideal for arc cathode processes

n   Compact design

n   Equipped for the future.







TruPlasma Bias Series 3000

Stable and multi-functional


Universal generators for your sputtering process

In particular, the TruPlasma Bias Series 3000 generators support the optical and metallic coating applications used in semiconductor technology or hard material coating, for example. They are also well-suited for applications with comparable voltage and current requirements.

n   High and low-voltage mode

n   Fast arc management

n   Stable and reproducible process results

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